Carbon Films Obtained from a C60 Fullerene Ion Beam

Document Type

Article

Publication Date

2002

Abstract

Carbon films have been produced by accelerating C60+ ions on silicon substrates with energies between 100 and 800 eV. The resulting films have been characterized by Raman spectroscopy and electrical resistivity measurements. Different deposition regimes have been distinguished depending on the energy of the incident fullerenes. At low energies intermolecular covalent bonds begin to insinuate, while at higher energies there is a coexistence of polymeric and amorphous islands. The samples have been annealed in order to study their thermal behavior. The tendency with increasing voltage, as observed by Raman spectroscopy, is to reach a similar behavior to that of annealed amorphous carbon.

Department

Physics and Astronomy

Publication Title

Diamond and Related Materials

DOI

10.1016/S0925-9635(01)00592-1

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